Technology Description
Inventors at OSU have developed a method for creating conductive oxide thin films from aqueous precursor solutions that have high density, low surface roughness, high optical transmissivity, and good electronic properties. This solution processing method of preparing the conductive oxide thin films has a lower energy cost than conventional deposition techniques that utilize vacuum and higher temperature anneals. These formulations of high-purity metal oxides are promising materials that can provide performance advantages in a variety of applications, including: Solar panels, LEDs, touch screens, printed circuits, etc.
Features & Benefits
Current processes for preparing conductive thin film material are principally done by vacuum processing, such as chemical vapor deposition or sputtering. These processes require highly specialized equipment, and high energy requirements make them expensive. These processing techniques also require repeated high temperature anneals to produce high-density films, further increasing energy requirements. Solution processing methods for making high density films can create opportunities for high surface area electronics that are cost-prohibitive with current techniques.
Patent Pending
UV-Vis transmission of solution-deposited ITO (black) and conventionally sputtered ITO (red)