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Methods for Enhanced Atomic Layer Deposition

Technology Description Oregon State university researchers have created a method and device for in-situ microwave annealing to assist Atomic Layer deposition (ALD). This technology will allow for improved ALD film properties at lower temperatures. The technology allows for improvements such as eliminating the need to remove the substrate and film between...

Published: 3/19/2024 | Inventor(s): John Conley

Keywords(s): Atomic layer deposition (ALD), energy enhanced ALD, in-situ annealing, microwave annealing

Category(s): Chemical, Device, Engineering, Materials Science, Nanoscience & Microtechnologies, Physical Science